Khalifa University Library 

Normal view MARC view ISBD view

Chemical process design and simulation : Aspen Plus and Aspen HYSYS applications / Juma Haydary.

By: Haydary, Juma [author.].
Publisher: [New York, N.Y.?] : Hoboken, NJ, USA : AIChE, the Global Home of Chemical Engineers ; Wiley, 2019Description: xliv, 391 pages : illustration ; 29 cm.Content type: text Media type: unmediated Carrier type: volumeISBN: 1119089115; 9781119089117.Subject(s): Chemical processesDDC classification: 660/.2812
List(s) this item appears in: New arrivals- June 2019
Item type Home library Collection Call number Status Date due Barcode Item holds
Books Main Campus
Main Campus Library
General Collection TP155.7 .H39 2019 (Browse shelf) Checked out 24/08/2020 1002020
Total holds: 0

Includes bibliographical references and index.<br />

//]]>